Hellmanex III for Critical Cleaning
Hellmanex III for critical cleaning of substrates.
Getting substrates clean is the essential starting point for fabrication of organic devices. Hellmanex III has been designed to provide exceptional cleaning of glass and quartz substrates, without damaging them or leaving a residue behind. Typically, we use 2 ml of Hellmanex III in 200 ml of hot water; and sonicate for 5 minutes before dump rinsing in water. As such, 100 ml of Hellmanex will provide cleaning for up to 50 racks of substrates.
To the best of our knowledge, the technical information provided here is accurate. However, Ossila assume no liability for the accuracy of this information. The values provided here are typical at the time of manufacture and may vary over time and from batch to batch.