UV Ozone Cleaner

Order Code: E511
Manual

Price

(excluding Taxes)

£1,950.00


UV Ozone Cleaner

Ossila's UV Ozone cleaning system is capable of removing contamination on the surface of samples, providing you with ultraclean surfaces within minutes. By using a high power UV light source ozone is generated which then breaks down surface contaminants into volatile compounds. These volatile compounds evaporate from the surface leaving no trace. This method can produce near-atomically clean surfaces without causing damage to the sample.

Our UV ozone cleaner houses a 120mm x 120mm tray for positioning samples under the UV light source. Simply place the samples onto the tray, close the door, set your time, and press go.

At £1950 Ossila's UV ozone cleaner will not be beaten on price and is ready to dispatch within one working day.

UV Ozone Cleaner


 



What is UV Ozone Cleaning?

UV ozone cleaning is a photo-sensitized oxidation process in which short wavelength UV radiation is absorbed by organic molecules in order to dissociate them from a surface via chemical reactions with ozone molecules. It is an excellent technique for cleansing surfaces of photo-resists, resins, residues from cleaning solvents, flux, oils, and for surface sterilization all of which can influence the properties of the surface of your sample. Unlike other cleaning techniques such as oxygen plasma treatment, UV ozone cleaning does not cause significant surface damage. 

How UV Ozone cleaners remove organic residue from a surface

The UV ozone system uses a high intensity UV light source which illuminates the target surface with light of two wavelengths, 185nm and 254nm. Molecular oxygen (O2) present within the system is dissociated by UV radiation with a wavelength less than 200 nm, resulting in two free radicals of oxygen (O•). Each of these free radicals can subsequently react with further molecular oxygen to produce ozone (O3) molecules (Figure 2). UV radiation above 200nm that is not absorbed by residual oxygen is strongly absorbed by organic chemical bonds present on the surface of the substrate. Upon absorption this causes the creation of excited states or organic radicals. These reactive organic species, when in contact with the unstable ozone molecules result in the formation of volatile species such as CO2, H2O, N2 and short chain organic compounds. These volatile compounds can easily desorb from the surface leaving it clean.

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UV Ozone Cleaner Applications

Examples of applications for UV Ozone cleaners:

  • Surface cleaning
  • Preparation for thin film deposition
  • UV curing
  • Surface sterilization
  • Cleaning of AFM/STM probes
  • UV chemical reactions
  • Cleaning of optical components
  • Improving surface hydrophilicity
  • Removal of surface monolayers
  • Oxidation of surfaces

Examples of materials that can be cleaned:

  • Quartz
  • Silicon
  • Silicon Oxide
  • Silicon Nitride
  • Gold
  • Nickel
  • Aluminium
  • Gallium Arsenide
  • Alumina
  • Glass
  • Stainless Steel

The images below shows the impact of UV ozone treatment on a substrate to improve surface hydrophilicity.

Low energy substrate surface before UV Ozone cleaning High energy substrate surface after UV Ozone cleaning
Water drop on OTS-treated silicon substrate (300 nm SiO2 on surface) before UV ozone cleaning (left) and after 10 minutes UV ozone cleaning (right).

 

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UV Ozone Cleaner Features

Ossila's UV ozone cleaner has the following features:

  • Lowest cost UV Ozone cleaner
  • 120 mm x 120 mm sample stage
  • Maximum sample height of 14 mm
  • Simple loading unloading using a drawer
  • Safety interlock for sample drawer
  • LCD display showing time passed and time left
  • 60 minute timer
  • High intensity UV light source
  • High temperature thermal cutout
  • Solvent free cleaning of samples
  • Provides ultra-clean surface

 

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UV Ozone Specifications

UV lamp type
Synthetic Quartz UV Grid Lamp
UV lamp dominant wavelengths 185 nm and 254 nm
UV lamp dimensions 100 mm x 100 mm
UV lamp supply 4000 V, 30 mA
UV lamp lifetime T80 (2000 hours); 8-10 years of standard daily use
Power supply  230 V, 0.6 A , 50 Hz  // opt. ( 110 V, 1.2 A, 60 Hz )
Max run time 59 minutes 59 seconds
Safety features Safety interlock, high temperature warning, thermal cutout
Substrate tray size 120 mm x 120 mm
Maximum recommended substrate size 100 mm x 100 mm

 

Overall Dimensions

Width 204 mm

Height 227 mm

Depth 300 mm


  

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To the best of our knowledge the technical information provided here is accurate. However, Ossila assume no liability for the accuracy of this information. The values provided here are typical at the time of manufacture and may vary over time and from batch to batch.