Gate Deposition Mask for High Density OFETs

Order Code: E336


(excluding Taxes)


An evaporation mask for deposition of gate contacts for use with the high density OFET system. A 200 μm standoff-spacer ensures that the mask does not touch the substrate while still enabling good deposition resolution.

Update: As part of our program of product improvement we have decided to simplify the masks available. Each type of mask is now available as a two sided mask. On one side a spacer and substrate holder are welded to the mask and on the other just a substrate holder. This will allow our customers to both options available to test out if they are uncertain which is best suited for their work. It also means you only need to purchase a single mask rather than two if you would like to use both systems.

Please note that the single sided masks will only remain available while stocks last. However, if you are concerned that the double sided masks will be too thick for your evaporator then please do get in touch as we will be happy to help with this.



Size 75 mm x 75 mm
Thickness 2 mm (exc. bolts)
Material Stainless steel
Capacity 12 substrates


High density OFET gate mask (dimensions)
Dimensioned diagrams of the high density linear OFET gate mask


High density OFET evaporation gate mask (photo)
Optical image of the high density OFET gate mask


High density interdigitated OFET evaporation gate mask (technical drawing)
Dimensioned diagrams of the high density interdigitated OFET gate mask holder


High density interdigitated evaporation gate mask (dimensions)
Dimensioned diagrams of the high density interdigitated OFET gate mask (substrate)


To the best of our knowledge the technical information provided here is accurate. However, Ossila assume no liability for the accuracy of this information. The values provided here are typical at the time of manufacture and may vary over time and from batch to batch.