ITO Substrates for OLEDs (Pixelated Anode)

Order Code: S101

Price

(excluding Taxes)

£425.00


Pre-patterned ITO substrates for OLED and OPV fabrication and testing. Use these substrates with our cathode deposition mask (E111) to create individual pixels.

Ossila's ITO substrates are manufactured from commercial-grade ITO used in the flat-panel display industry in order to endure high consistency and very low defect rates.

Each substrate has six ITO fingers, which when used with an Ossila evaporation shadow mask, creates six independent devices with dimensions of 1.5 mm x 3 mm (v1 cathode mask) or 1.5 x 4 mm (v2 cathode mask).

An additional cathode strip at the top of the substrate allows easy connection of both anodes and cathodes by attachment of electrical connection legs. A simple cleaning procedure then provides a clean and hydrophilic surface perfect for spinning PEDOT:PSS.

 

Datasheet

Substrate size 20 mm x 15 mm
Pack size 100 substrates per standard pack
Thickness 1.1 mm
Pixel dimensions (with cathode) 3 mm x 1.5 mm (4.5 mm2)
Glass type Polished soda lime, float glass
Substrate coating Fully oxidized ITO
ITO thickness 100 nm
ITO resistance 20 Ω / square
Glass roughness <1 nm RMS By AFM
ITO roughness 1.8 nm RMS (By AFM)
Packaging Stacks of 20 separated by cleanroom paper

 

OLED substrate with 6-pixels
Pixelated anode substrate overview
Device Schematic and a completed device.

 

Cleaning

We use the following cleaning routine for OPVs and OLEDs:

  • Sonicate in 1 vol.% Hellmanex solution for 5 mins in hot sonic bath
  • Rinse twice in hot water (dump rinse)
  • Sonicate in isopropyl alcohol (IPA) for 5 min in warm sonic bath
  • Rinse twice in warm water (dump rinse)

Hydrophilic surface treatment

We recommend finishing the cleaning routine with a final step of either sonication in sodium hydroxide (NaOH) solution or treatment with UV Ozone, which will provide a more uniformly hydrophilic surface to make the deposition of PEDOT:PSS more reproduceable.

      OR
          • Sonicate in fresh 10 vol.% NaOH solution for 5 mins in warm sonic bath
          • Rinse twice in hot water (dump rinse)
          • Store immersed in water until required
          • N2 blow dry

          Note: Exact times will depend upon the power and temperature of the sonic bath. Furthremore, excessive sonication in NaOH can also increase the resistance of the ITO surface.

           

           Characterisation

           

          AFM scan of ITO substrate AFM of glass surface of ITO substrates
          Left/Bottom: 10 µm x 10 µm AFM scan with Z-scale of ±5 nm. Right/Bottom: AFM of glass surface (1 µm x 1 µm x 3.5 nm). Courtesy of Richard T Grant.

           

          Transmittance of ITO
          Transmittance spectrum of ITO substrates.

           

          Download data as Excel spreadsheet here.

           

          To the best of our knowledge, the information provided here is accurate. However, Ossila assume no liability for the accuracy of this information. The values provided here are typical at the time of manufacture and may vary over time and from batch to batch.