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Regioregular poly(3-hexylthiophene-2,5-diyl), commonly known as P3HT (CAS number: 104934-50-1), is a popular low bandgap polymer donor with applications in organic photovoltaics, polymer solar cells, OLEDs, and OFETs. We sell a full range of P3HT with different molecular weights and regioregularities for a variety of research purposes. Produced by Merck KGaA, this high quality P3HT collection allows a wide range of science and engineering to be undertaken.
High Solubility
Dissolve and break up readily
High Quality
For OPVs, OLEDs, & OFETs
Multiple Batches
Various molecular weights available
Semiconducting Polymer
For various applications
Sale on End of Line Batches While Stocks Last
We have significantly lowered prices for certain batches of P3HT, available only while stocks last. We also offer discounts for 5g and 10g quantities, and further reductions for 25g quantity for teaching labs and scale-up tests.
The highest regioregularity P3HT (M1011, RR = 97.6%) produces highly crystalline films and is recommended for OFETs, nanofibril formation and fast drying OPVs at the thin interference peak (90 nm). However, the exceptionally high regioregularity of this P3HT means that gelling and surface roughness can be an issue for slow-drying thick-film OPVs (>200 nm). Lower molecular weight and regioregularity P3HT is recommended for inkjet and other large area or slow drying deposition techniques where gelling/aggregation and surface roughness need to be avoided.
All the P3HT below is highly soluble (50 mg/ml) in chlorinated solvents such as chloroform, chlorobenzene, dichlorobenzene and trichlorobenzene. The intermediate and lower molecular weight P3HT materials are recommended for use with non-chlorinated solvents such as xylene, toluene and THF due to their increased solubility.
General Information
Full Name
Poly(3-hexylthiophene-2,5-diyl)
Synonyms
P3HT
CAS Number
104934-50-1
Chemical Formula
(C10H14S)n
Molecular Weight
See the batch details table at bottom of the page for information
HOMO / LUMO
HOMO = -5.2 eV, LUMO = -3.2 eV
Solubility
Chloroform, chlorobenzene
Classification / Family
Polythiophenes, Organic semiconducting materials, Low band gap polymers, Polymer donors, Organic photovoltaics, Polymer solar cells, OLEDs, OFETs
This procedure details the fabrication and charge mobility measurements for OFETs made from the M104 batch of P3HT. Download a full OFET fabrication report.
Field effect mobilities in excess of 0.12 cm2/Vs are recorded using M104 when the active layer is dispensed on OTS-treated silicon oxide dielectric by static spin coating from an optimized high/low boiling point solvent mix.
High hole mobility in conjunction with good solubility and partial air stability make regioregular P3HT a reference material of choice for both fundamental and applied research in organic electronic, physics and chemistry. As one of the most well-studied organic semiconductor, P3HT is often acknowledge to be one of the benchmark against which any new p-type or donor conjugate molecule should be compared and evaluated.
Mobility has previously been found to be positively correlated with increasing region-regularity, slow drying time (achieved using high boiling point solvent), lowering of the surface energy, and molecular weight in excess of 50 kD. These conditions favour p-p stacking parallels to the OFET substrate, which in turn results in improved charge transport across the transistor channel [1-13].
Substrate size
20 x 15 mm
Gate conductivity
1-30 O·cm (Boron doped)
Silicon oxide thickness
300 nm
Device per substrates
Five, common gate
Channel length
30 µm
Channel width
1000 µm
The active layer solution preparation, spin coating, substrate annealing and measurements are performed in a glove box under a nitrogen atmosphere (H2O <0.1 PPM; O2 < 5/8 PPM).
Active Layer Preparation
High-Regioregular and high molecular weight RR-P3HT (M104) (RR = 96.3%, Mw = 77,500, Mn = 38,700) is dissolved in a mix of high and low boiling point solvent in order to exploit the beneficial effect of long drying time and increase the wettability of low energy surface, respectively.
5 mg/ml of M104 dissolved in anhydrous Chloroform:Trichlorobenzene (99:1) mix;
Vial is placed on hot plate (70°C) with a stirrer bar for 30 minutes;
Solution cooled down at room temperature and then filtered with a 0.45 µm PTFE (hydrophobic) filter;
Solution stored overnight on a hot plate at 30°C to prevent excessive aggregation of the P3HT molecules.
Substrate Cleaning
Substrates loaded on to substrate rack (to keep them in upright position);
Sonicated in hot Hellmanex III solution (1%) for five minutes;
Rinsed twice in hot water;
Sonicated in warm Isopropyl alcohol (70°C) for five minutes;
Rinsed twice in cold DI water;
Substrates stored in DI water.
Thermal Deposition of Electrodes and Contact Pads
Done on Edwards 306 Thermal coater in clean room condition;
Secondary mask is added to selectively evaporate the gate and drain/source pads;
Vacuum chamber pumped down to a vacuum pressure of 5 x 10-6 mbar;
Chromium adhesion layer: 5 nm, rate 0.05 nm/s;
Aluminum: 80 nm, rate: 0.4 nm/s;
Changed secondary mask to deposit electrodes (FET channels);
Vacuum: 2-3 x 10-6 mbar;
Chromium adhesion layer: 1 nm, rate 0.05 nm/s;
Gold: 40 nm; rate 0.05 nm/s.
PFBT Treatment for Au Electrodes (Laminar flow)
Oxygen plasma treatment, 30 seconds at 100 W;
Substrates immersed in 2.5 mMol/l solution of PFBT in isopropyl alcohol at room temperature;
Substrates rinsed twice in pure isopropyl alcohol;
Substrates are blown with nitrogen gun.
OTS Treatment for SiO2 Dielectric (Laminar flow)
A solution of OTS (25 microlitres) in cyclohexane (anhydrous grade, 1 ml) prepared in glove box;
Substrates (pre-loaded on a substrate rack) loaded into the annealing beaker, which is filled with approx. 50 ml of cyclohexane in a fume hood;
Previously prepared OTS solution quickly added to the cyclohexane and mixed with a pipette tip;
The glass lid is placed halfway onto the beaker, which is carefully filled with more cyclohexane until it is full and the lid is fully closed;
The final solution (60 ml) contains OTS at a concentration of 1 mMol/l;
Substrates kept for 20 minutes in the OTS solution;
Substrates removed from the OTS solution, quickly rinsed twice in clean cyclohexane, and then are blown dry with nitrogen gun.
Contact Angle Assessment
The water-drop test on the treated silicon is a quick test to qualitatively assess the effect of the OTS on the silicon substrates to ensure that the fabrication has functioned correctly. You can get a good approximation of the contact angle using your eye or a simple digital photo.
Previous quantitative assessments have shown that this routine will produce contact angles between 90 and 110°C (depending on the lab temperature, humidity and other factors). You can quantify that contact angle easily and accurately using the Ossila Contact Angle Goniometer.
P3HT (M104) spin coating (glove box)
30 µl of Organic Semi-Conductor (OSC) solution delivered on the middle of the substrate and then spin coated at 1000 rpm for 10 s followed by 60 s at 2000 rpm;
Cotton swab soaked in chlorobenzene to thoroughly wipe clean the contact pads and the rest of the substrates with the exception of the area around the channel;
High precision cotton swab to clean between devices to avoid cross-talking and reduce leakage;
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P3HT MSDS sheet