Deposition Masks, 25 mm Square
Substrates and Fabrication
Deposition masks for 25mm x 25mm patterned ITO substrates.
Create four large 48mm2 photovoltaic or LED pixels.
The S2006 deposition masks are part of Ossila's award winning prototyping platform for photovoltaic devices and light emitting diodes (LEDs). The holes in the mask align with the ITO on our patterned substrates to create either 4 large pixels, with areas of 48mm2, or one single pixel, with an area of 255mm2.
The deposition mask has three main components: a back panel, a substrate holder and a shadow mask. The substrates are held in place against the back panel, and the patterned deposition layer is positioned above. The layers are then screwed together, keeping the substrates secure during depostion.
There is also the option of an additional spacer layer between the substrate and shadow mask, which prevents the active layer materials coming into contact with the shadow mask.
General Specifications
| Material | Stainless steel |
|---|---|
| Outer Dimensions | 95mm x 95mm |
| Substrate Recesses | 9 |
| Recess Dimensions | 25.3mm x 25.3mm |
| Thickness | 1.7mm without spacer, 1.8mm with spacer (exc. bolts) |
Four Pixel Electrode Mask
The Four Pixel mask overlaps the ITO on the S2006C1 25mm square substrate, creating 4 large pixels with areas of 6mm x 8mm = 48mm2. The total area of devices on a single substrate is therefore 192mm2.
Electrical connection to the electrodes can be made easily using the P2011A Test Board.
Four Pixel Electrode Mask with Busbar
The Four Pixel mask can also create an busbar of evaporated material along the top and bottom of the substrate. This helps to reduce electrical resistance during measurement.
Single Pixel Electrode Mask
The Single Pixel mask overlaps the ITO on the S2006C1 25mm square substrate, creating a single large pixel with an area of 15mm x 17mm = 255mm2.
Single Pixel Electrode Mask with Busbar
The Single Pixel mask can also create an busbar of evaporated material along the top and bottom of the substrate. This helps to reduce electrical resistance during measurement.
Active Area Mask
Ossila's active area mask is specifically designed to coat the areas where your electrodes will be overlapping. The range of materials and techniques that can be used is nearly endless; whether it is vacuum deposited small molecules, chemical vapor deposition of ceramics, or sputtering of metallic alloys, the active area mask will allow you to accurately define your deposition area. The deposition pattern overlaid onto our S2006C1 25mm square substrate is shown to the right.
