Molybdenum Disulfide Monolayer Film
CAS Number 1317-33-5
2D Materials, Low Dimensional Materials, Materials, Molybdenum Disulfide (MoS2), Transition Metal Chalcogenides (TMCs), Transition Metal Dichalcogenides (TMDs)
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MoS2 monolayer film (silicon)MoS2 Monolayer Film, for applications in electronic and optoelectronic devices
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Technical Data | MSDS | Applications | Literature and Reviews | Related Products | Resources and Support
Molybdenum disulfide (MoS2) monolayer film, CAS number 1317-33-5, is a direct bandgap semiconductor. When in bulk form however, this material has an indirect bandgap. The photoluminescence of MoS2 films increases with decreasing layer thickness. This means that luminescence is strongest in monolayer films, while it is absent in bulk material.
High Purity
>99% Purity Molybdenum Monolayer Film Film
Worldwide shipping
Quick and reliable shipping
Low Cost
Low Cost Molybdenum Disulfide
Applications
Applications in electronic and optoelectronic devices
Technical Data
| CAS Number | 1317-33-5 |
| Chemical Formula | MoS2 |
| Molecular Weight | 160.07 g/mol |
| Bandgap | ~1.8 eV |
| Synonyms | Molybdenum sulfide, Molybdenum disulphide, Molybdenum(IV) sulfide |
| Classification / Family | Transition metal dichalcogenides (TMDCs), 2D semiconductor materials, Nano-electronics, Nano-photonics, Materials science |
Product Details
| Substrate | SiO2/Si | Sapphire | Sapphire |
| Product code | M2165F11 | M2166F11 | M2166T11 |
| Size | 1 cm × 1 cm* | 1 cm × 1 cm* | 1 cm × 1 cm* |
| Growth Method | CVD synthesis | CVD synthesis | CVD synthesis |
| Appearance | Transparent | Transparent | Transparent |
| Purity | >99% | >99% | >99% |
| Transparency | >97% | >97% | >97% |
| Coverage | >95% | >95% | n.a. |
| Number of Layers | 1 | 1 | n.a. |
| Sheet Resistance | n.a. | n.a. | n.a. |
| Transfer method | Directly grown | Directly grown | Directly grown |
| Substrate Thickness | 300 nm (oxide layer) | 300 µm | 300 µm |
*Other sizes available: up to 2 cm × 2 cm or 2 inches in diameter (sapphire substrate only).
High-quality molybdenum disulfide (MoS2) monolayer films are available on two different substrates as standard: SiO2/Si and Sapphire. Different substrates of monolayer MoS2 films, including Glass, Silicon and Quartz are also available via custom order.
Discontinuous isolated triangular crystals (crystal islands) films are also available via custom request. Please contact us for more information regarding custom products.
Pricing
| Substrate | Product Code | Size | Quantity (EA) | Price |
|---|---|---|---|---|
| SiO2/Si | M2165F11 | 1 cm × 1 cm | 1 | £420 |
| Sapphire | M2166F11 | 1 cm × 1 cm | 1 | £420 |
| Sapphire | M2166T11 | 1 cm × 1 cm | 1 | £420 |
MSDS Documents
Molybdenum disulfide monolayer film on silicon MSDS Sheet
Molybdenum disulfide monolayer film on sapphire MSDS Sheet
Molybdenum disulfide isolated flakes on sapphire MSDS Sheet
Applications
Molybdenum disulfide monolayer films can be built into electronic and optoelectronic devices such as photovoltaic solar cells, FETs, sensors, and photodetectors.
Synthesis
High-quality molybdenum disulfide monolayer films were grown directly on the substrates (SiO2/Si and Sapphire) by the chemical vapour deposition (CVD) method. The films were later transferred to the desired substrates using wet chemical transfer process.
Usage
MoS2 monolayer film can be used in research purposes such as microscopic analysis, photoluminescence, and Raman spectroscopy studies. MoS2 few-layer film can also be transferred to other substrates.
Literature and Reviews
- Catalytic growth of large area monolayer molybdenum disulfide film by chemical vapor deposition, H. Li et al., Thin Solid Films 669, 371–376 (2019); doi: 10.1016/j.tsf.2018.10.055.
- Large-Area Epitaxial Monolayer MoS2, D. Dumcenco et al., ACS Nano, 9 (4), 4611-4620 (2019); DIO: 10.1021/acsnano.5b01281.
- Molecular Beam Epitaxy of Highly Crystalline Monolayer Molybdenum Disulfide on Hexagonal Boron Nitride, D. Fu et al., J. Am. Chem. Soc., 139, 9392−9400 (2017); DOI: 10.1021/jacs.7b05131.
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