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Active Area Deposition Mask, Low Density

Substrates and Fabrication


Product Code E307-SPC
Price $325 ex. VAT

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An evaporation mask for deposition of materials into the active area (source-drain channels). For use with the low density OFET system. A 100 μm standoff-spacer ensures that the mask does not touch the substrate while still enabling good deposition resolution.

Mask with direct contact: For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw, we recommend the use of the direct contact mask to get well-defined edges.

Mask with 100 μm spacer: For normal thermal evaporation systems we recommend the use of masks with the 100 μm spacer to help avoid scratches and allow better out-gassing.

Datasheet

Low density active area evaporation mask (technical drawing)
Dimensioned diagram of the low density OFET active area mask

 

Low density OFET active area evaporation mask (dimensions)
Zoomed-in dimensioned diagram of the low density OFET active area mask.

 

Low density active area evaporation mask (photo)
Optical image of the low density OFET active area mask.

To the best of our knowledge the information provided here is accurate. The values provided are typical at the time of manufacture and may vary over time and from batch to batch. Products may have minor cosmetic differences (e.g. to the branding) compared to the photos on our website. All products are for laboratory and research and development use only.

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