Deposition Masks, 20 x 15 mm (Legacy, Generation II)
A shadow mask for deposition onto the active area of pixels for Ossila standard OLED/OPV substrates (S171). Used for depositing metal oxides or other materials onto the ITO (only over the active pixels). Available both with and without a 200 μm spacer to separate the substrate from the mask, to help avoid contact scratches and allow out-gassing of residual solvent from polymer layers.
There is a newer version of this product. Our generation I and II substrates and masks will be discontinued soon and are only available while stocks last. Please contact us for further details.
Datasheet
| Size | 75 mm x 75 mm |
| Thickness | 1.2 mm (without spacer) or 1.4 mm with spacer (excluding bolts) |
| Material | Stainless steel |
| Substrate capacity | 12 substrates (S171) |
Mask with 200 μm spacer: For normal thermal evaporation systems we recommend the use of masks with the 200 μm spacer to help avoid scratches and allow better out-gassing.
Mask with direct contact: For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw, we recommend the use of the direct contact mask to get well-defined edges.
To the best of our knowledge, the information provided here is accurate. However, Ossila assume no liability for the accuracy of this information. The values provided here are typical at the time of manufacture and may vary over time and from batch to batch.