Deposition Masks, 20 x 15 mm (Legacy, Generation II)
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A shadow mask for deposition onto the active area of pixels for Ossila standard OLED/OPV substrates (S171). Used for depositing metal oxides or other materials onto the ITO (only over the active pixels). Available both with and without a 100 μm spacer to separate the substrate from the mask, to help avoid contact scratches and allow out-gassing of residual solvent from polymer layers.
|Size||75 mm x 75 mm|
|Thickness||1.7mm without spacer, 1.8mm with spacer (exc. bolts)|
|Substrate capacity||12 substrates (S171)|
Mask with 100 μm spacer: For normal thermal evaporation systems we recommend the use of masks with the 100 μm spacer to help avoid scratches and allow better out-gassing.
Mask with direct contact: For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw, we recommend the use of the direct contact mask to get well-defined edges.
To the best of our knowledge the information provided here is accurate. The values provided are typical at the time of manufacture and may vary over time and from batch to batch. Products may have minor cosmetic differences (e.g. to the branding) compared to the photos on our website. All products are for laboratory and research and development use only.