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Insulator Deposition Mask, High Density

Substrates and Fabrication

Product Code E3310-SPC
Price $325 ex. VAT

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A mask for deposition of the insulator layer; for use with Ossila's high density OFET system.

Outer dimensions: 75 mm x 75 mm

Number of OFETs: 20 per substrate.

Mask with direct contact (no spacer): For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw, we recommend the use of the direct contact mask to get well-defined edges.

Mask with 100 μm spacer: For normal thermal evaporation systems we recommend the use of masks with the 100 μm spacer to help avoid scratches and allow better out-gassing.


High density twelve substrate evaporation stack (technical drawing)
Insulator Mask for High Density OFET system (technical drawing).
High density twelve substrate evaporation stack (dimensions)
Insulator Mask for High Density OFET system (substrate dimensions).

To the best of our knowledge the information provided here is accurate. The values provided are typical at the time of manufacture and may vary over time and from batch to batch. Products may have minor cosmetic differences (e.g. to the branding) compared to the photos on our website. All products are for laboratory and research and development use only.

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