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Deposition Masks, 20 x 15 mm (Legacy, Generation I)

Solar Cell Prototyping Platform, Substrates and Fabrication

Product Code E115-SPC
Price $325 ex. VAT

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There is a newer version of this product. Our generation I and II substrates and masks will be discontinued soon and are only available while stocks last. Please contact us for further details.

6-Pixel Design

Ossila's vacuum deposition masks have been specifically designed for our standardised 6-pixel substrates, which are used for the fabrication of light-emitting diodes (LEDs) and photovoltaic devices. At Ossila, we offer a range of masks for sale which can be used in a variety of different applications. These include the deposition of electrodes of varying sizes for the screening of new materials, masks for the deposition of semiconducting active/interfacial materials, and masks for the deposition of our 6-pixel design. All masks are made from stainless steel with the option of an additional spacer layer. More information on the general specifications of the masks can be found below. The following masks are suitable for use with our S101 substrate design:

Spacer Layers

Spacer Layer

Each mask has the option of the addition of a 100 µm spacer layer that can be placed between the mask and the substrate. This spacer layer reduces the direct contact between the surface of the substrate and the mask by over 98%. This is recommended for samples that are easily scratched or for porous samples that experience a large amount of out-gassing. For sputtering or other non-directional deposition techniques, the spacer layer is not recommended as the presence of a spacer layer will reduce the precision of your deposited edge.

Deposition Mask Specifications and Designs

General Specifications

Material Stainless steel
Outer Dimensions 75mm x 75mm
Substrate Recesses 12
Recess Dimensions 20.3mm x 15.3mm
Thickness 1.7mm without spacer, 1.8mm with spacer (E114: 1.6mm without spacer, 1.7mm with spacer)(exc. bolts)

Small-Area Electrode Mask

Small Area Electrode

Ossila's small-area electrode mask has been designed for use with the most advanced materials, where small defects in deposited layers can significantly impact device performance and characterisation. By limiting the active area of the device, the probability of a defect being present within the device stack is reduced, allowing you to truly determine a material's maximum possible performance. Each individual pixel has an active area of 0.45mm2. The deposition pattern is shown to the right, overlaid onto our S101 substrate.

The schematic drawing of our small area electrode mask can be seen below:

Small area mask

Standard Electrode Mask

Standard Electrode

Ossila's standard electrode mask is our first and most popular pre-patterned electrode design, two electrode strips of 3mm width are used to complete 3 device stacks each producing a total of 6 individual pixels per substrate with a total active area of 4.5mm2. The deposition pattern is shown to the right overlaid onto our S101 substrate.

The schematic drawing of our standard electrode mask can be seen below:

Schematic drawing of the Ossila standard electrode mask

Reduced Resistance Electrode Mask

Reduced resistance electrode

Ossila's reduced resistance mask is a modified version of our standard electrode design, where a single electrode strip is used to define all 6 pixels. The advantage of using a wider strip for the electrode is that the reduction in sheet resistance within the film allows for small increases in the maximum achievable performance of devices. The active area of each pixel is the same as the standard electrode at 4.5mm2. The deposition pattern is shown to the right overlaid onto our S101 substrate.

The schematic drawing of our reduced resistance electrode mask can be seen below:

Schematic drawing of Ossila's reduced resistance electrode mask

Active Material Mask

Active area

Ossila's active area deposition mask is used for depositing material directly where the pixels for each device are going to be. This mask is suited for the deposition of both interfacial layers and the active material being studied with the device, in addition this mask is compatible with all three electrode deposition masks. By limiting the area of deposition of interfacial and active materials the encapsulation of devices can be made more effective, this is due to the reduction in transport via interfaces between layers. The deposition pattern is shown to the right overlaid onto our S101 substrate.

The schematic drawing of our active area mask can be seen below:

TCO Deposition Mask

TCO mask

Ossila's transparent conducting oxide (TCO) deposition mask can be used to deposit additional layers on top of our pre-patterned S101 6-pixel substrates. In addition, this mask can be used to deposit the 6-pixel design onto other substrates -- such as our ultra flat quartz substrates, or silicon oxide substrates if you wish to fabricate devices using your own TCO layers. The deposition pattern is shown to the right overlaid onto our ultra flat quartz substrate.

TCO schematic drawing

To the best of our knowledge the information provided here is accurate. The values provided are typical at the time of manufacture and may vary over time and from batch to batch. Products may have minor cosmetic differences (e.g. to the branding) compared to the photos on our website. All products are for laboratory and research and development use only.

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