Solution processable OFET and Sensor Substrates

Substrates with pre-patterning of the ITO to act as a source and drain contact allows for entirely solution-processed OFETs, sensors and chemiresistors (as well as many other device types) with no need for vacuum processing or thermal evaporations.

Note that this system is pin-compatible with the low-density OFET test chips and processing equipment. Gate deposition masks are not required for solution-processed gates, but are also provided to allow for mixed vacuum and solution-processing where appropriate.