Measurement Aperture Mask, 20 x 15 mm (Legacy, Generation II)

Solar Cell Prototyping Platform, Substrates and Fabrication

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Measurement aperture masks with electrochemically-etched holes to accurately define the active area of a pixel during measurement and to stop indirect/scattered light.

Useful for OPV measurements under solar simulators or OLEDs with luminance meters. For use with pixelated cathode substrates (S171) in the push fit test board.

E361 is designed for use with the single large area pixel.
E362 is designed for use with six small pixels for most general measurements where the scattered light between pixels (typically less than 1%) is not an issue.
E363 provides a set of three masks such that individual pixels can be masked.

There is a newer version of this product. Our generation I and II substrates and masks will be discontinued soon and are only available while stocks last. Please contact us for further details.

Datasheet

Outer dimensions	20 mm x 15 mm x 0.2 mm
Apertures	1 x 72.96 mm² 6 x 2.56 mm²
Aperture tolerance	±5%

Outer dimensions

20 mm x 15 mm x 0.2 mm

Apertures

1 x 72.96 mm²

6 x 2.56 mm²

Aperture tolerance

±5%

Dimensions of pixelated cathode measurement aperture masks — Dimensions for the large area aperture mask (top) and small area aperture mask (bottom)

Dimensions of measurement aperture mask for individual pixels — Dimensions for the individual pixel masks used when pixel cross-talk is an issue.

To the best of our knowledge the information provided here is accurate. The values provided are typical at the time of manufacture and may vary over time and from batch to batch. Products may have minor cosmetic differences (e.g. to the branding) compared to the photos on our website. All products are for laboratory and research and development use only.