Gate Deposition Mask - ITO OFETs
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An evaporation mask for deposition of gate contacts onto Ossila's pre-patterned ITO substrates (S161). The T-shaped aperture allows the gate to cover the interdigitated source-drain contacts while also providing easy electrical connection via the Ossila USB test board.
Mask with direct contact: For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw, we recommend the use of the direct contact mask to get well-defined edges.
Mask with 100 μm spacer: For normal thermal evaporation systems we recommend the use of masks with the 100 μm spacer to help avoid scratches and allow better out-gassing.
Datasheet
| Size | 75 mm x 75 mm |
|---|---|
| Thickness | 1.7mm without spacer, 1.8mm with spacer (exc. bolts) |
| Material | Stainless steel |
| Capacity | 12 substrates (S161 or S162) |
| Spacer | Optional 100 μm substrate separation spacer on one side |
Lid
Substrate holder and 100 μm standoff
Gate shadow mask
To the best of our knowledge the information provided here is accurate. The values provided are typical at the time of manufacture and may vary over time and from batch to batch. Products may have minor cosmetic differences (e.g. to the branding) compared to the photos on our website. All products are for laboratory and research and development use only.