Hellmanex III for Critical Cleaning
Getting substrates clean is the essential starting point for fabrication of organic devices. Hellmanex III has been designed to provide exceptional cleaning of glass and quartz substrates, without damaging them or leaving a residue behind. Typically, we use 2 ml of Hellmanex III in 200 ml of hot water; and sonicate for 5 minutes before dump rinsing in water. As such, 100 ml of Hellmanex will provide cleaning for up to 50 racks of substrates.
Substrate Rack for Cleaning and Storage
- Solvent and Acid Resistant
- Often Bought With Hellmanex III
Available From £16
To the best of our knowledge the information provided here is accurate. However, Ossila assume no liability for the accuracy of this page. The values provided are typical at the time of manufacture and may vary over time and from batch to batch. All products are for laboratory and research and development use only, and may not be used for any other purpose including health care, pharmaceuticals, cosmetics, food or commercial applications.