Top Gate Shadow Mask



Topgate Shadow mask zoom The OFET gate shadow mask is designed for thermal evaporation of gates either above or below the source-drain contacts on Ossila's standard OFET substrates (20mm x 15 mm). The substrates are kept away from direct contact with the mask by use of a 200 µm standoff which prevents damage to delicate polymer layers and allows evaporation of any residual solvents while in vacuum chambers.


Order codeQuantityPrice
E261 1 £199




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Printable HTML Datasheet Adobe PDF

The mask can be used in conjunction with the source drain evaporation stack and linear/interdigitated shadow masks to produce all four types of OFET:
• top-gate/bottom contact
• top-gate/top contact
• bottom-gate/bottom contact
• bottom-gate/top contact

OFET gate shadow mask dimensions

OFET gate shadow mask dimensions

Details:

Outer dimensions: 75mm x 75mm x 1.4 mm
Capacity: 12 substrates each of 20mm x 15mm
Material: Steel


Compatible components:

Source drain evaporation stack: E191
Source drain masks: E201, E211
Substrates: S111, S141
Dimensions Schematic of the substrate system

Dimensions(left) and schematic (right) of the substrate system including source-drain contacts.


Lid, Substrate  holder and 200µm standoff, Gate shadow mask


 Lid





 Substrate holder and 200 µm standoff





 Gate shadow mask






Close up of the assembled mask (without lid) showing the standoffTopgate Shadow mask zoom



Close up of the assembled mask (without lid) showing the standoff.
Schematic (left) Photo (right)






To the best of our knowledge the technical information provided here is accurate. However, Ossila assume no liability for the accuracy of this information. The values provided here are typical at the time of manufacture and may vary over time and from batch to batch.






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