A shadow mask for deposition only onto the active area of pixels for Ossila standard OLED/OPV substrates (S101). Used for depositing metal oxides or other materials onto the ITO only over the active pixels.
Available both with and without a 200 um spacer to separate the substrate from the mask to help avoid contact scratches and allow out-gassing of residual solvent from polymer layers.
Mask with 200 um spacer
For normal thermal evaporation systems we recommend the use of masks with the 200 um spacer to help avoid scratches and allow better out-gassing.
Mask with direct contact
For sputtering and other non-directional deposition systems, as well as for thermal deposition systems with oblique angles or a very short throw we recommend the use of the direct contact mask to get well defined edges.
Full mask and zoomed in corner details of mask with lid.
To the best of our knowledge the information provided here is accurate. However, Ossila assume no liability for the accuracy of this information. The values provided here are typical at the time of manufacture and may vary over time and from batch to batch.
OLED/OPV components
PCDTBT, P3HT, PCBM and PEDOT:PSS.
OFET components
OLED/OPV overview
OFET overview
